Precision Fused Quartz Glass – Superior Optical & Thermal Performance
- Fused quartz glass represents the pinnacle of optical material science, delivering
- unmatched transparency across ultraviolet, visible, and infrared wavelengths.
- Anole manufactures precision fused quartz components for semiconductor lithography,
- laser optics, spectroscopy, and high-temperature industrial applications where
- conventional glass cannot perform.
- With near-zero thermal expansion (CTE ≈ 0.5 × 10⁻⁶ /°C), exceptional chemical
- inertness, and optical transmittance exceeding 95% across 200–2500 nm, fused quartz
- is the material of choice for mission-critical optical systems.
Why Choose Fused Quartz Glass?
✓ Extreme UV Transparency
Fused quartz transmits deep ultraviolet light (200 nm and below) with minimal
absorption, making it essential for UV lithography masks, excimer laser optics,
and spectroscopic instrumentation. Conventional borosilicate glass becomes opaque
in the UV range.
✓ Thermal Stability & Low CTE
Thermal expansion coefficient near zero (0.5 × 10⁻⁶ /°C) ensures dimensional
stability across extreme temperature ranges (–50 °C to 1000+ °C). Ideal for
precision optical benches, high-temperature furnace windows, and thermal imaging
systems.
✓ Superior Chemical Resistance
Fused quartz resists attack from virtually all acids, alkalis, and organic solvents
except hydrofluoric acid. This chemical inertness makes it the preferred material
for laboratory glassware, chemical reactors, and biopharmaceutical processing vessels.
✓ Optical Homogeneity & Low Birefringence
Manufactured with strict control of refractive index uniformity and minimal stress
birefringence, fused quartz delivers consistent optical performance across large
apertures—critical for precision imaging, interferometry, and laser beam delivery.
Fused Quartz Material Grades & Technical Specifications
Corning 7980 (Ultra-Low OH)
• Refractive index: 1.45850 @ 589 nm
• Thermal expansion: 0.5 × 10⁻⁶ /°C
• OH content: < 5 ppm (ultra-low) • Transmittance: > 95% (200–2500 nm)
• Density: 2.203 g/cm³
• Softening point: 1710 °C
• Applications: Lithography masks, high-precision optics, UV systems
Corning 7979 (Standard Grade)
• Refractive index: 1.45850 @ 589 nm
• Thermal expansion: 0.5 × 10⁻⁶ /°C
• OH content: 50–200 ppm
• Transmittance: > 92% (200–2500 nm)
• Density: 2.203 g/cm³
• Softening point: 1710 °C
• Applications: General optical components, laboratory glassware
Heraeus Covantics 312
• Refractive index: 1.4585 @ 589 nm
• Thermal expansion: 0.5 × 10⁻⁶ /°C
• Bubble density: < 0.1 bubbles/cm³ • Inclusion content: Minimal • Transmittance: > 95% (200–2500 nm)
• Homogeneity: ±0.0001 refractive index
• Applications: High-power laser optics, precision optical systems
Tosoh Quartz
• Refractive index: 1.4585 @ 589 nm
• Thermal expansion: 0.5 × 10⁻⁶ /°C
• OH content: Variable (low to ultra-low options)
• Transmittance: > 93% (200–2500 nm)
• Purity: 99.99%+ SiO₂
• Applications: Semiconductor processing, analytical instrumentation
OHARA Fused Quartz
• Refractive index: 1.4585 @ 589 nm
• Thermal expansion: 0.5 × 10⁻⁶ /°C
• Specialized wavelength optimization available
• Transmittance: > 94% (200–2500 nm)
• Applications: Specialized laser and spectroscopy applications
Momentive Fused Silica
• Refractive index: 1.4585 @ 589 nm
• Thermal expansion: 0.5 × 10⁻⁶ /°C
• IR-transmitting variants available
• Transmittance: > 95% (200–3000 nm)
• Applications: Thermal imaging, infrared optics
